Optical-detection element, solid-state imaging device, and method for driving solid-state imaging device

ABSTRACT

An optical-detection element includes a p-type supporting-layer, an n-type buried charge-generation region to implement a photodiode with the supporting-layer, a p-type shield region buried in the buried charge-generation region, a gate insulating-film contacted with the shield region, a transparent electrode on the gate insulating-film, a p-type well region buried in the supporting-layer, and an n + -type charge-readout region buried in the supporting-layer at an edge of the well region toward the buried charge-generation region.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to Japanese Patent Application No. 2017-078851, filed Apr. 12, 2017. The contents of this application are incorporated herein by reference in its entirety.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The present invention relates to an optical-detection element having radiation immunity, a solid-state imaging device in which a plurality of optical-detection elements is arranged, and a method for driving the solid-state imaging device.

2. Description of the Related Art

WO 2016/013227 discloses a specific transparent electrode for a gate electrode of a MOS structure, which serves as a photo-electric converter (hereinafter, the photo-electric converter is referred as a “photogate”) in a pixel used for a radiation tolerant solid-state imaging device. The photogate includes an n-type buried charge-generation region buried in an upper portion of a p-type supporting-layer. The transparent electrode is provided on the buried charge-generation region via an insulating-film. A channel is formed in the buried charge-generation region.

In the solid-state imaging device (the photogate image sensor) having the photogate, which is disclosed in WO 2016/013227, charges generated by photo-electric conversion in the photogate are accumulated in a charge-readout region (a charge-detection portion) buried adjacent to the buried charge-generation region, and a potential change in the charge-readout region is read out as a signal. When the signal charges are electrons, a pinning operation by holes is carried out in order to suppress a generation of a dark current in the photogate. In the pinning operation, to deactivate a surface of a semiconductor layer, the surface is filled by holes of minority carriers. In the invention disclosed in WO 2016/013227, a fixed negative voltage is constantly applied to the transparent electrode implementing the photogate for achieving the pinning operation. In addition, the potential in the charge-readout region, serving as a drain in the photogate, is required to be kept at a sufficiently high positive voltage in order to ensure a charge-detection operating-margin in the solid-state imaging device.

The inventors of the present invention found out that, when the photogate image sensor is driven, while the surface potential is constantly pinned under the above-described conditions, a significantly strong electric field is caused at a boundary between the charge-readout region and the photogate to generate a large dark current.

SUMMARY OF THE INVENTION

In view of the foregoing problem, an object of the present invention is to provide an optical-detection element having radiation immunity capable of capturing images with a high sensitivity and a wide dynamic range, while minimizing an electric field concentration in a charge-readout region to suppress a generation of a dark current, a solid-state imaging device using the optical-detection element as a pixel, and a method for driving the solid-state imaging device.

In order to attain the object, a first aspect of the present invention inheres in an optical-detection element encompassing (a) a supporting-layer of a first conductivity type, (b) a buried charge-generation region of a second conductivity type buried in an upper portion of the supporting-layer to implement a photodiode with the supporting-layer, (c) a shield region of the first conductivity type having a higher impurity concentration than the supporting-layer and buried at an upper surface of the buried charge-generation region, (d) a gate insulating-film contacted with an upper surface of the shield region, (e) a transparent electrode provided on the gate insulating-film, (f) a well region of the first conductivity type having a higher impurity concentration than the supporting-layer and buried in the upper portion of the supporting-layer, and (g) a charge-readout region of the second conductivity type having a higher impurity concentration than the buried charge-generation region and buried in the upper portion of the supporting-layer at an edge of the well region toward the buried charge-generation region. The shield region according to the first aspect of the present invention is occasionally referred to as a “virtual electrode” in an optical-detection element having a structure other than a photogate structure. Thus, conventionally, an arrangement of a transparent electrode on such a virtual electrode was considered inappropriate according to technical common knowledge in the art. In contrast to the technical common knowledge in the art that in which an arrangement of the shield region and the transparent electrode on the upper surface of the buried charge-generation region is inappropriate, the optical-detection element according to the first aspect employs the shield region and the transparent electrode to exert an electrostatic potential induced by a potential of the transparent electrode on the surface of the shield region via the gate insulating-film, so that a surface potential of the shield region can be pinned by charges of the first conductivity type.

A second aspect of the present invention inheres in a solid-state imaging device in which a plurality of pixels is arranged, each pixel corresponding to the optical-detection element according to the first aspect. Thus, the solid-state imaging device according to the second aspect can also exert, in each of the pixels, an electrostatic potential induced by a potential of the transparent electrode on the surface of the shield region via the gate insulating-film, so that a surface potential of the shield region can be pinned by charges of the first conductivity type.

A third aspect of the present invention inheres in a method for driving a solid-state imaging device in which a plurality of pixels each having a photogate structure is arranged, so as to solve the conventional problem described above. In the method for driving the solid-state imaging device according to the third aspect, a first voltage for pinning charges having reverse polarity reverse to signal charges and a second voltage shifted from the first voltage in a direction in which a channel potential of a buried charge-generation region deepens, are applied to a transparent electrode implementing the photogate structure in each of the pixels at a timing of each of divided periods of one frame, so as to suppress electric field concentration in a charge-readout region in each of the pixels having the photogate structure.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a circuit diagram illustrating a schematic structure of an entire photogate image sensor according to a first embodiment of the present invention;

FIG. 2 is a schematic plan view illustrating an optical-detection element of one pixel included in the photogate image sensor according to the first embodiment;

FIG. 3A is a cross-sectional view of the optical-detection element taken from the direction A-A in FIG. 2;

FIG. 3B is a cross-sectional view of the optical-detection element taken from the direction B-B in FIG. 2;

FIG. 4 is a diagram for describing a potential profile in a depth direction in a photogate of the optical-detection element according to the first embodiment;

FIG. 5 is a potential profile illustrating an operation of the optical-detection element according to the first embodiment;

FIG. 6 is a chart for describing a drive timing of the photogate image sensor according to the first embodiment;

FIG. 7 is a diagram illustrating a change in dark current at a plurality of photogate voltages using a cumulative frequency distribution in a photogate image sensor according to a comparative example;

FIG. 8 is a schematic view illustrating a phenomenon in which an excessive dark current is generated at a boundary between a photogate and a charge-detection portion in the photogate image sensor according to the comparative example;

FIG. 9 is a circuit diagram illustrating a schematic structure of an entire photogate image sensor according to a second embodiment of the present invention;

FIG. 10A is a diagram for describing a potential profile during charge storage in an optical-detection element according to the second embodiment;

FIG. 10B is a diagram for describing a potential profile during reset and signal detection in the optical-detection element according to the second embodiment;

FIG. 11 is a chart for describing a drive timing of the photogate image sensor according to the second embodiment;

FIG. 12 is a schematic plan view illustrating an optical-detection element of one pixel included in a photogate image sensor according to a third embodiment of the present invention;

FIG. 13 is a cross-sectional view of the optical-detection element taken from the direction C-C in FIG. 12;

FIG. 14 a circuit diagram illustrating a schematic structure of an entire photogate image sensor according to a fourth embodiment of the present invention;

FIG. 15 is a schematic plan view illustrating an optical-detection element of one pixel included in the photogate image sensor according to the fourth embodiment;

FIG. 16A is a cross-sectional view of the optical-detection element taken from the direction D-D in FIG. 15;

FIG. 16B is a cross-sectional view of the optical-detection element taken from the direction E-E in FIG. 15;

FIG. 17 is a potential profile illustrating an operation of the optical-detection element according to the fourth embodiment;

FIG. 18 is a chart for describing a drive timing of the photogate image sensor according to the fourth embodiment;

FIG. 19A is a diagram for describing a potential profile during charge storage in the optical-detection element according to the fourth embodiment;

FIG. 19B is a diagram for describing a potential profile during reset and signal detection in the optical-detection element according to the fourth embodiment;

FIG. 20 is a schematic plan view illustrating an optical-detection element of one pixel included in a photogate image sensor according to a fifth embodiment of the present invention;

FIG. 21 is a cross-sectional view of the optical-detection element taken from the direction F-F in FIG. 20;

FIG. 22 is a circuit diagram illustrating level shifters for generating a first voltage and a second voltage of a photogate scanner in the photogate image sensor according to the fifth embodiment;

FIG. 23 is a chart for describing a drive timing of the photogate image sensor according to the fifth embodiment;

FIG. 24A is a diagram for describing a potential profile during reset and signal detection in the optical-detection element according to the fifth embodiment;

FIG. 24B is a diagram for describing a potential profile during charge storage in the optical-detection element according to the fifth embodiment;

FIG. 25 is a diagram for describing a potential profile in a depth direction in a photogate of the optical-detection element according to the fifth embodiment;

FIG. 26 is a schematic plan view illustrating an optical-detection element of one pixel included in a photogate image sensor according to a sixth embodiment of the present invention;

FIG. 27 is a cross-sectional view of the optical-detection element taken from the direction G-G in FIG. 26;

FIG. 28A is a diagram for describing a potential profile during reset and signal detection in the optical-detection element according to the sixth embodiment; and

FIG. 28B is a diagram for describing a potential profile during charge storage in the optical-detection element according to the sixth embodiment.

DESCRIPTION OF THE EMBODIMENTS

Hereinafter, first to sixth embodiments of the present invention will be described with reference to the Drawings. Note that, in the following description of the Drawings, the same or similar reference numerals denote the same or similar elements and portions. In addition, it should be noted that the Drawings are schematic and the relationship between thickness and planar dimensions, the ratios of dimensions, and the like are different from actual ones. Therefore, specific thicknesses and dimensions should be determined in consideration of the following description. Moreover, the Drawings also include portions having different dimensional relationships and ratios from each other.

The following first to sixth embodiments each illustrate a device or method embodying the technical ideas of the present invention. The technical ideas of the present invention are not intended to be limited to the following materials, shapes, structures, or arrangements of the respective elements described below. Various modifications will be apparent to those skilled in the art within the technical ideas of the present invention. Moreover, in the following description, the directions “left-right” and “up-down” are definitions used for the sake of convenience, and such definitions do not limit the technical ideas of the present invention. Thus, for example, when the orientation of the paper is rotated by 90 degrees, “left-right” and “up-down” shall be read mutually exchanged. When the paper is rotated by 180 degrees, naturally, “the left” is changed to “the right” and “the right” is changed to “the left”.

It is apparent to those skilled in the art that a region or layer provided with a mark “n” or “p” in the Drawings denotes a polarity of element made of a semiconductor such as a semiconductor region or semiconductor layer. The superscript “+” added to the mark “n” or “p” denotes that the corresponding semiconductor region has a higher impurity concentration than a region without the superscript “+” added, and the superscript “−” added to the mark “n” or “p” denotes that the corresponding semiconductor region has a lower impurity concentration than a region without the superscript “−” added.

First Embodiment

As illustrated in FIG. 1, a photogate image sensor according to a first embodiment of the present invention includes a pixel area in which a plurality of photogate-pixels (optical-detection elements) Q_(ij) is arranged in a matrix form, and a peripheral circuit including a reset-transistor scanner 22, a select-transistor scanner 23, and a readout circuit 24 disposed at the periphery of the pixel area.

As illustrated in FIGS. 2, 3A, and 3B, the pixel Q_(ij) according to the first embodiment is an optical-detection element having a photogate structure including a supporting-layer 1 of a first conductivity type (p-type), a buried charge-generation region 5 of a second conductivity type (n-type) buried in an upper portion of the supporting-layer 1 to implement a photodiode with the supporting-layer 1, a p-type shield region 6 having a higher impurity concentration than the supporting-layer 1 and provided on an upper surface of the buried charge-generation region 5, a gate insulating-film 4 contacted with an upper surface of the shield region 6, and a transparent electrode 14 provided on the gate insulating-film 4. The shield region 6 is occasionally referred to as “a virtual electrode” in an optical-detection element having a structure other than the photogate structure, and an arrangement of the transparent electrode 14 on such a virtual electrode does not follow the technical common knowledge in the art. Thus, in earlier technology, an arrangement of the p-type shield region 6 on the upper surface of the buried charge-generation region 5 shall be considered inappropriate for the photogate structure.

In contrast to the conventional technical common knowledge, the pixel Q_(ij) of the first embodiment uses positively the shield region 6 in the photogate structure, such that the pixel Q_(ij) further includes a p-type well region 11, which has a higher impurity concentration than the supporting-layer 1 and is buried in the upper portion of the supporting-layer 1. An n⁺-type charge-readout region 8 having a higher impurity concentration than the buried charge-generation region 5 is buried at an edge of the well region 11 and in contact with the buried charge-generation region 5 and the shield region 6. An n⁺-type reset-drain region 7 having a higher impurity concentration than the buried charge-generation region 5 is also buried in the upper portion of the well region 11 separately from the charge-readout region 8. The pixel Q_(ij) according to the first embodiment further includes a reset-gate electrode 12 stacked on the gate insulating-film 4 and allocated above the well region 11 between the charge-readout region 8 and the reset-drain region 7.

A photogate PG_((i, j)) of the pixel Q_(ij) according to the first embodiment corresponds to a region in which the transparent region 14 is allocated immediately above the buried charge-generation region 5 and the shield region 6 via the thin gate insulating-film 4.

The transparent electrode 14 may be made of a material transparent to a wavelength of light hν incident on the photogate PG_((i, j)). When the transparent electrode 14 is formed using a polycrystalline silicon (hereinafter, referred to as a “doped-polysilicon (DOPOS)”) film doped with n-type impurity atoms such as phosphor (P) or arsenic (As), from the viewpoint of the manufacturing process, the use of DOPOS film is convenient, because the boundary between the transparent electrode 14 and the charge-readout region 8 can be self-aligned. Instead of the DOPOS film, an oxide thin film including a transparent conductive oxide such as tin oxide (SnO₂), indium (In)-doped tin oxide (ITO), aluminum (Al)-doped zinc oxides (AZO), gallium (Ga)-doped zinc oxide (GZO), or indium (In)-doped zinc oxide (IZO) may be used.

When the DOPOS film doped with an impurity of the second conductivity type is used for the reset-gate electrode 12, from the viewpoint of the manufacturing process, the use of DOPOS film is also convenient, because the boundary between the reset-gate electrode 12 and the charge-readout region 8 and the boundary between the reset-gate electrode 12 and the reset-drain region 7 can be self-aligned; however, any other film may be used instead of the DOPOS film.

The optical-detection element is not limited to a simple MOS transistor in which a silicon oxide film is used as the gate insulating-film 4. That is, the optical-detection element may be implemented by MIS transistors, in which a single-layer film of at least one of a strontium oxide (SrO) film, a silicon nitride (Si₃N₄) film, an aluminum oxide (Al₂O₃) film, a magnesium oxide film (MgO) film, a yttrium oxide (Y₂O₃) film, a hafnium oxide (HfO₂) film, a zirconium oxide (ZrO₂) film, a tantalum oxide (Ta₂O₅) film, and a bismuth oxide (Bi₂O₃) film other than the silicon oxide film or a composite film obtained by stacking a plurality of these films is used as the gate insulating-film 4. However, these gate insulating-film materials need to have radiation immune characteristics.

FIGS. 3A and 3B illustrate a case in which a p-type semiconductor substrate (Si substrate) is used as the “supporting-layer 1”. However, a p-type epitaxial growth layer having a lower impurity concentration than the p-type semiconductor substrate may be grown on the semiconductor substrate and the epitaxial growth layer may be used as the supporting-layer 1 instead of the semiconductor substrate. Alternatively, a p-type epitaxial growth layer may be grown on the n-type semiconductor substrate and the epitaxial growth layer may be used as the supporting-layer 1. Alternatively, a p-type SOI semiconductor layer is used as the supporting-layer 1 so as to form a silicon on insulator (SOI) structure.

As illustrated in FIG. 2, the pixel Q_(ij) according to the first embodiment may be designed to have a rectangular shape in a planar pattern, for example. FIG. 2 illustrates an upper surface of the pixel Q_(ij) when the gate insulating-film 4 is omitted. The pixel Q_(ij) has a photogate structure implemented by a p⁺-type joint-region 3, the transparent electrode 14, the n⁺-type charge-readout region 8, the reset-gate electrode 12, and the n⁺-type reset-drain region 7 arranged from the right to the left in the right-left direction in FIG. 2. FIG. 2 omits an amplification-transistor SF_((i, j)) and a select-transistor SL_((i,j)) illustrated in FIG. 1.

As illustrated in FIGS. 3A and 3B, a p-type buried pixel-isolation region 2 is buried in the upper portion of the supporting-layer 1 so as to surround the pixel Q_(ij). An element-isolation insulating-film 9 is buried in an upper portion of the buried pixel-isolation region 2 so as to isolate the respective pixels Q_(ij) from each other. The buried pixel-isolation region 2 is located between the buried charge-generation region 5 and the element-isolation insulating-film 9. The p⁺-type joint-region 3 having a higher impurity concentration than the buried pixel-isolation region 2 is buried in a part of the upper portion of the buried pixel-isolation region 2 between the shield region 6 and the element-isolation insulating-film 9 and in contact with the gate insulating-film 4. The joint-region 3 is electrically connected to the p-type buried pixel-isolation region 2. That is, the shield region 6 at the end on the right side is electrically connected to the p-type buried pixel-isolation region 2 via the p⁺-type joint-region 3. Accordingly, the end of the p-type shield region 6 is electrically short-circuited by the p-type supporting-layer 1 via the p⁺-type joint-region 3 to have a ground potential.

As illustrated on the left sides of FIGS. 2 and 3A, the p-type well region 11 having the same impurity concentration as the buried pixel-isolation region 2 is buried in the upper portion of the supporting-layer 1 in the pixel Q_(ij) at the same depth as the buried pixel-isolation region 2. The n-type reset-drain region 7 having a higher impurity concentration than the buried charge-generation region 5 is buried in a part of the upper portion of the well region 11 and in contact with the gate insulating-film 4. The p-type well region 11 and the p-type buried pixel-isolation region 2 may be buried as a common region by the same process. The p-type well region 11 and the p-type buried pixel-isolation region 2 merged into a common region may serve as a “pixel-isolation region”. The p-type buried pixel-isolation region 2 and the p-type well region 11 are not necessarily buried at the same depth or do not necessarily have the same impurity concentration, but are preferably buried at the same depth and preferably have the same impurity concentration; otherwise the manufacturing process is complicated.

As illustrated in FIG. 3A, the n⁺-type charge-readout region 8 having a higher impurity concentration than the buried charge-generation region 5 is buried in the region at the boundary between the well region 11 and the buried charge-generation region 5 and in contact with the gate insulating-film 4. The reset-gate electrode 12 is stacked on the gate insulating-film 4 and allocated above the well region 11 between the reset-drain region 7 and the charge-readout region 8 so as to implement a reset-transistor RT_((i, j)) having a structure equivalent to an nMOS transistor. The reset-transistor RT_((i, j)) applies a higher-level voltage to the reset-gate electrode 12 to exhaust charges of the charge-readout region 8 to the reset-drain region 7.

The pixel Q_(ij) according to the first embodiment is illustrated in a representation of equivalent circuit in a region of (i-row)×(j-column) surrounded by the dotted line as a part of the matrix in FIG. 1. The pixel Q_(ij) has a structure implemented by the photogate PG_((i,j)), a charge-detection portion FD_((i,j)) provided adjacent to the photogate PG_((i,j)), the reset-transistor RT_((i,j)) which resets a potential of the charge-detection portion FD_((i, j)), the amplification-transistor SF_((i, j)) which amplifies a potential change of the charge-detection portion FD_((i,j)), and the select-transistor SL_((i,j)) which selects an output of the amplification-transistor SF_((i,j)), (i=1 to m; j=1 to n:m and n are each a positive integer of 2 or greater). Although FIG. 1 illustrates simplified four pixels Q_(ij) for illustration purposes, the present embodiment is not limited to the 2×2 matrix pattern. An arbitrary number of pixels can be arranged in a two-dimensional matrix depending on design requirements so as to have an m×n matrix pattern (min=approximately 300 to 10000 and n=approximately 200 to 8000).

The m-number reset drive-lines corresponding to the m-number rows in the matrix are distributed from the reset-transistor scanner 22. For example, the reset drive-lines DRT_((i)) and DRT_((i+)) are connected to the gates of the reset-transistors RT_((i,j)) and RT_((i+1, j)) in the pixels Q_(ij) and Q_(i+1, j) belonging in the i-th and (i+1)-th rows, respectively, in the matrix. The reset-transistor scanner 22 controls, in units of rows, voltages applied to the reset-transistors RT_((i,j)) and RT_((i+1, j)) in the pixels Q_(ij) and Q_(i+1, j) belonging in the i-th and (i+j)-th rows via the reset drive-lines DRT_((i)) and DRT_((i+1)) in the i-th and (i+j)-th rows. Although not illustrated in FIG. 1, voltages applied to reset-transistors belonging in other rows, such as (i−1)-th and (i+2)-th rows in the matrix, are also controlled in units of rows. A higher-level voltage V (H) of the reset-transistor scanner 22 used may be a typical power-supply voltage, for example. As a lower-level voltage of the reset-transistor scanner 22, a ground voltage can be used, for example.

The m-number of selection drive-lines corresponding to the m-number of rows in the matrix are distributed respectively from the select-transistor scanner 23. For example, the selection drive-lines DSL_((i)) and DSL_((i+1)) are connected to the gates of the select-transistors SL_((i,j)) and SL_((i+1,j)) in the pixels Q_(ij) and Q_(i+1, j) belonging in the i-th and (i+j)-th rows, respectively, in the matrix. The select-transistor scanner 23 controls, in units of rows, voltages applied to the select-transistors SL_((i, j)) and SL_((i+1,j)) in the pixels Q_(ij) and Q_(i+1,j) belonging in the i-th and (i+j)-th rows via the selection drive-lines DSL_((i)) and DSL_((i+1)) in the i-th and (i+j)-th rows. Although not illustrated in FIG. 1, voltages applied to select-transistors belonging in other rows, such as (i−1)-th and (i+2)-th rows in the matrix, are also controlled in units of rows. Like the reset-transistor scanner 22, a higher-level voltage V (H) used in the select-transistor scanner 23 may be assigned to an output voltage of a typical power-supply, for example. A lower-level voltage of the select-transistor scanner 23 may be assigned to a ground voltage, for example.

The drain of the reset-transistor RT_((i,j)) is connected to a voltage supply-line so that a reset-drain voltage VRD of a DC voltage can be applied to the reset-transistor RT_((i, j)). The drain of the amplification-transistor SF_((i, j)) is connected to a voltage supply-line so that an amplification drain voltage VDD of a DC voltage can be applied to the amplification-transistor SF_((i,j)). The source of the photogate PG_((i,j)), the source of the reset-transistor RT_((i, j)), and the gate of the amplification-transistor SF_((i, j)) are connected together, and the cathode of the charge-detection portion FD_((i, j)) indicated as a diode in the equivalent circuit is connected to the connection point of the photogate PG_((i, j)), the reset-transistor RT_((i,j)), and the amplification-transistor SF_((i,j)). The anode of the charge-detection portion FD_((i, j)) of the diode is grounded. There is no drain side of the photogate PG_((i, j)).

The source of the amplification-transistor SF_((i,j)) is connected to the drain of the select-transistor SL_((i,j)). The select-transistors SL_((i,j)) and SL_((i+1,j)) on the source side are provided with an output signal-line V_(sig(j)) connected to the readout circuit 24. An output signal of the selected pixel Q_(ij) or Q_(i+1,j) is transmitted to the readout circuit 24 via the output signal-line V_(sig(j)). Similarly, the select-transistors SL_((i,j+1)) and SL_((i+1,j+1)) on the source side are provided with an output signal-line V_(sig(j+1)) connected to the readout circuit 24. An output signal of the selected pixel Q_(i,j+1) or Q_(i+1,j+1) is transmitted to the readout circuit 24 via the output signal-line V_(sig(j+1)). The transmitted signals are subjected to predetermined processing in the readout circuit 24, and the processed output signals are finally sent to the outside of a semiconductor chip.

In the pixel Q_(ij) according to the first embodiment, the signal charges generated by photo-electric conversion in the photogate PG_((i,j)) during a storage period are read out from the charge-readout region 8 during a readout period. In the pixel Q_(ij) according to the first embodiment, a photogate voltage VPG of a constant value (DC) approximate to zero volt is applied to the transparent electrode 14, so that the surface potential of the shield region 6 is pinned by holes of majority carriers in the shield region 6 allocated immediately below the gate insulating-film 4, which is shown in FIG. 4. That is, when the shield region 6 is a p-type, the surface potential of the shield region 6 is pinned by the holes of the majority carriers in the shield region 6 allocated immediately below the transparent electrode 14, so that the interface states at the interface between the gate insulating-film 4 and the shield region 6 are deactivated.

As used herein, the phrase “voltage approximate to zero volt” means a span of voltages encompassing a slightly shifted value from zero volt in the negative direction or the positive direction, since a voltage when the surface of the p-type shield region 6 is filled with the holes practically fulfills flat band conditions, and the gate voltage under the flat band conditions depends on the impurity concentration of the shield region 6, the material of the transparent electrode 14, the charges in the gate insulating-film 4, and the like. Accordingly, electric field concentration between the charge-detection portion FD_((i,j)) and the photogate PG_((i,j)) is suppressed even when the potential of the charge-readout region 8 is set at a high value, so as to suppress a generation of a dark current, ensure a radiation-tolerant performance, and sufficiently ensure a signal detection margin.

As indicated by the curved broken line in FIG. 4, when the photogate voltage VPG applied to the transparent electrode 14 is a positive value (VPG>zero volt), the shield region 6 is depleted. When the photogate voltage VPG applied to the transparent electrode 14 is zero volt (VPG=zero volt) as indicated by the curved solid line in FIG. 4, the surface potential of the p-type shield region 6 is pinned by majority carriers (holes) by electrostatic potentials induced by the potential of the transparent electrode 14 on the surfaces of the buried charge-generation region 5 and the shield region 6 via the gate insulating-film 4. A channel potential of the buried charge-generation region 5 is shallower than the case in which the photogate voltage VPG is a positive value, but has a depth sufficient to hold the charges, as illustrated in FIG. 4. The interface states at the semiconductor surface are increased by irradiation of gamma rays but deactivated because the surface is filled with a large number of holes when the photogate voltage VPG is zero volt, so as to suppress an increase in dark current.

When the gamma rays are irradiated to the semiconductor element, a large number of electron-hole pairs are generated in an oxide film on the semiconductor surface, and therefore, slow holes remain and positive charges concentrate in the oxide film on the semiconductor surface. As a result, the semiconductor surface is depleted to cause a large dark current. As the interface states at the semiconductor interface is greater, a larger dark current is generated. In contrast, as illustrated in FIGS. 3A and 3B, only the thin gate insulating-film 4 having a thickness of approximately 4 nm to 10 nm is present above the buried charge-generation region 5, and an absolute quantity of the holes generated in the gate insulating-film 4 is small, as compared with a regular p-n junction photo-electric converter in which a thick oxide film is provided on a semiconductor surface. Further, in association with the deactivation of the interface states described above, the radiation hardening is greatly improved.

FIG. 5 is a potential profile illustrating the operation of the pixel Q_(ij) according to the first embodiment. The photogate voltage VPG of the constant value (DC) approximate to zero volt is applied to the transparent electrode 14 so that the surface potential of the p-type shield region 6 is pinned by majority carriers (holes). When the reset-drain voltage VRD is sufficiently deeper than the channel potential upon the pinning, the signal charges (electrons) photo-electrically converted by the photogate PG_((i, j)) can constantly be transferred to the charge-readout region 8, and the signal charges are thus not accumulated in the photogate PG_((i,j)). Accordingly, it is possible to decrease the capacitance of the charge-detection portion FD_((i, j)) during the charge readout and to increase the charge voltage conversion gain, so as to achieve higher-level voltage-sensitivity.

FIG. 6 is a timing chart illustrating a drive timing focusing on the reset drive-lines DRT_((i)) and DRT_((i+1)) and the selection drive-lines DSL_((i)) and DSL_((i+1)) in the i-th and (i+1)-th rows, among the drive-lines extending in the horizontal direction in FIG. 1. The symbol “1H” represents a row-readout period, and the symbol “1V” represents a frame-readout period, on the assumption that the readout operation is carried out in order of row by row.

In the pixel Q_(ij) in the i-th row, a photo-electric conversion and storage operation is carried out in the storage period Storage(i). Although not illustrated in FIG. 6, the photogate voltage VPG of the constant value (DC) approximate to zero volt is applied to the transparent electrode 14 in the respective pixels Q_(ij) in the storage period Storage(i) so that the semiconductor surface is pinned.

Subsequently, in the pixel Q_(ij) in the i-th row, the photogate voltage VPG of the constant value (DC) approximate to zero volt is applied to the transparent electrode 14 in the respective pixels Q_(ij) in the readout period Read(i) continued from the storage period Storage(i) so that the semiconductor surface is pinned, although not illustrated in FIG. 6. The selection drive-line DSL_((i)) of the select-transistor scanner 23 is shifted to a higher-level voltage in the readout period, so that the pixel signal is read out to the output line. When the reset drive-line DRT_((i)) of the reset-transistor scanner 22 is shifted to a higher-level voltage at the intermediate stage of the readout period, the charge-readout region 8 is reset.

Immediately before the reset operation, a signal Sig_((i)) of the signal charges having been accumulated in the charge-detection portion FD_((i, j)) is read out from the charge-readout region 8. Immediately after the reset operation, a signal Res_((i)) at a reset level in which the signal charges of the charge-detection portion FD_((i,j)) are exhausted is read out from the charge-readout region 8. The signals are then subjected to correlated double sampling (CDS) in the read out circuit 24 which reads a difference between the signal Sig_((i)) of the signal charges accumulated and the signal Res_((i)) at the reset level, so as to obtain net signals in which threshold variation of the amplification-transistor SF_((i,j)) or the like is removed.

Thereafter, the same operation as in the i-th row is repeated sequentially in the (i+1)-th row, the (i+2)-th row, the (i+3)-th row, . . . per horizontal scanning period in the time direction, so as to carry out the readout operation for the entire pixel area in the photogate image sensor. The potential difference between the charge-readout region 8 and photogate PG_((i,j)) is kept at a small value in each row, so as to prevent electric field concentration.

Comparative Example

A comparative example is described below with reference to FIGS. 7 and 8, in which the shield region 6 is omitted from the structure of the pixel Q_(ij) of the photogate image sensor illustrated in FIGS. 1 to 3B, while the photogate voltage VPG is kept constant. The axis of abscissas in FIG. 7 is an output level of pixels during dark time in the comparative example, and the axis of ordinates is cumulative frequency of occurrence of a dark current. The value of the reset-drain voltage VRD is set at approximately 2 volts. While the fixed photogate voltage VPG applied constantly is used as a parameter, the photogate voltage VPG is varied from zero volt to −2 volts.

In the photogate image sensor according to the comparative example, as illustrated in FIG. 7, as the photogate voltage VPG applied constantly is shifted to a value in the negative direction, the dark current is greatly increased. The reason for this is probably the trap-assisted tunneling (TAT) or the band-to-band tunneling (BTBT) caused at the boundary between the charge-readout region 8, which is the charge-detection portion FD_((i, j)), and the photogate PG_((i, j)). The TAT or the BTBT generates excessive electrons, as the electric field concentration is generated between the charge-detection portion FD_((i,j)) and the photogate PG_((i,j)), as illustrated in FIG. 8, in association with the shift of the photogate voltage VPG increased in the negative direction, while the voltage of the charge-detection portion FD_((i, j)) is kept at a high positive value.

It is necessary to decrease the voltage of the charge-detection portion FD_((i,j)), namely, the reset-drain voltage VRD to a value as low as 1 volt, for example, in order to prevent the electric field concentration. However, possible signal amplitude in the charge-detection portion FD_((i,j)) is reduced in the photogate image sensor according to the comparative example. That is, in the photogate image sensor according to the comparative example, because the photogate voltage VPG is kept constant, the charge-detection margin is greatly reduced, and accordingly, the dynamic range is decreased.

In contrast, the photogate image sensor according to the first embodiment can suppress a generation of a dark current because the voltage applied to the transparent electrode 14 is not a negative voltage, and even when the voltage is approximate to zero volt, the surface potential of the shield region 6 can be pinned by charges (holes) of majority carriers due to the electrostatic potentials induced by the transparent electrode 14 on the shield region 6 via the gate insulating-film 4. Further, since the electric field concentration between the charge-detection portion FD_((i,j)) and the photogate PG_((i,j)) can be suppressed without a decrease in the voltage of the charge-detection portion FD_((i,j)), namely, the reset-drain voltage VRD, the charge-detection margin can be ensured. Accordingly, the radiation-hardened image sensor with high sensitivity and wide dynamic range can be achieved.

Second Embodiment

A photogate image sensor according to a second embodiment is illustrated with a case in which the photogate voltage VPG applied to the photogate PG_((i, j)) is not a constant value but is subjected to a clocking operation between two values. The photogate image sensor according to the second embodiment differs from the photogate image sensor according to the first embodiment illustrated in FIG. 1 in the circuit structure further including a photogate scanner 21 for binary drive. The photogate scanner 21 for binary drive is provided at the periphery of the pixel area, in which a plurality of photogate-pixels Q_(ij) is arranged in a matrix form, as illustrated in FIG. 9.

The photogate scanner 21 applies, to the transparent electrode 14 of the respective pixels Q_(ij) illustrated in FIGS. 2, 3A, and 3B, a first voltage at which the surface potential at the interface between the shield region 6 and the gate insulating-film 4 is pinned by majority carriers in the shield region 6 and a second voltage shifted from the first voltage in a direction in which the channel potential of the buried charge-generation region 5 deepens. And then, the photogate scanner 21 executes a clocking operation between the first and second voltages. In particular, according to the timing chart as illustrated in FIG. 11, the photogate scanner 21 divides one frame into a “storage period” and a “readout period” at each row (i), and applies, to the transparent electrode 14 of the respective pixels Q_(ij), the first voltage in the storage period and the second voltage in the readout period so as to implement the clocking operation.

As illustrated in FIG. 9, the m-number of photogate drive-lines corresponding to the m-number of rows in the matrix are distributed from the photogate scanner 21. For example, photogate drive-lines DPG_((i)) and DPG_((i+1)) are connected to the gates of the photogates PG_((i,j)) and PG_((i+1,j)) in the pixels Q_(ij) and Q_(i+1,j) belonging in the i-th and (i+1)-th rows, respectively. The photogate scanner 21 controls, in units of rows, voltages applied to the photogates PG_((i, j)) and PG_((i+1, j)) in the pixels Q_(ij) and Q_(i+1, j) belonging in the i-th and (i+j)-th rows in the matrix via the photogate drive-lines DPG_((i)) and DPG_((i+1)). Although not illustrated in FIG. 9, voltages applied to photogates belonging in other rows, such as (i−1)-th and (i+2)-th rows in the matrix, are also controlled in units of rows.

The photogate scanner 21 includes a first voltage apply-terminal 211 and a second voltage apply-terminal 212. The first voltage apply-terminal 211 is a node for applying the first voltage V_((pin)) in the storage period to accumulate charges generated in the photogate PG_((i, j)) due to a photo-electric conversion and storage effect. When the first voltage V_((pin)) is applied, the pinning is carried out so that charges with reverse polarity reverse to charges of an output signal are accumulated in the shield region 6 immediately below the photogate PG_((i, j)). The first voltage V_((pin)) is applied to the photogate PG_((i,j)) so that the photogate channel potential for the charges of the output signal is shallow.

The second voltage apply-terminal 212 is a node for applying the second voltage V_((rd)) in the readout period to detect, as a signal, signal charges photo-electrically converted in the storage period by the photogate PG_((i,j)). The second voltage V_((rd)) is applied to the photogate PG_((i, j)) so that the photogate channel potential for the signal charges of the output signal is deepened. During the application of the second voltage V_((rd)) in the readout period, the charge-readout region 8 implementing the charge-detection portion FD_((i, j)) is reset to the reset-drain voltage VRD. Since the signal charges are accumulated before the reset operation, and the signal charges are exhausted after the reset operation, a net signal component due to the photo-electric conversion is read out from a potential difference between the potentials before and after the reset operation at the charge-readout region 8.

As described below, because the potential of the charge-readout region 8 implementing the charge-detection portion FD_((i, j)) can be increased so as to ensure the charge-detection margin, and the voltage of the transparent electrode 14 in the photogate PG_((i,j)) can also be increased to the second voltage V_((rd)), the potential difference between the charge-readout region 8 implementing the charge-detection portion FD_((i, j)) and the transparent electrode 14 in the photogate PG_((i, j)) will be kept at a low value in the readout period.

When the first voltage V_((pin)), is applied to the photogate PG_((i,j)) in the storage period, because the charge-readout region 8 implementing the charge-detection portion FD_((i,j)) is in a floating state, in association with the decrease of the photogate voltage VPG from the second voltage V_((rd)) to the first voltage V_((pin)), the potential of the charge-readout region 8 is also decreased due to capacitive coupling between the transparent electrode 14 in the photogate PG_((i, j)) and the charge-readout region 8 implementing the charge-detection portion FD_((i, j)). Accordingly, the potential difference between the charge-readout region 8 implementing the charge-detection portion FD_((i,j)) and the transparent electrode 14 in the photogate PG_((i,j)) can be kept at a low value also in the storage period.

The first voltage V_(pin)) is set at a lower voltage than the second voltage V_((rd)). The first voltage V_((pin)) and the second voltage V_((rd)) are determined in view of a reset level of the reset-drain voltage VRD applied to the reset-drain region 7. In the photogate image sensor according to the second embodiment, as a result of a simulation of the potential of the buried charge-generation region 5 for the signal charges by a one-dimensional calculation, it has been found out that the reset level can be set at approximately 2 to 3 volts, and the second voltage V_((rd)) applied to the photogate PG_((i,j)) can be set at approximately 0 to 1 volt. Since the voltage V_(FD(ij)) of the charge-detection portion FD_((i, j)) is a value decreased from the reset level by a reset feedthrough (typically, a positive value of 0.5 volt or less), the following condition is fulfilled in the readout period: V _(FD(ij)) −VPG≥2 to 3 volts  (1)

The potential relationship ascribable to the relation prescribed by Eq. (1) will be described below.

In the storage period, the first voltage V_((pin)), applied to the photogate PG_((i,j)) can be set at approximately zero volt according to the one-dimensional calculation described above as a value capable of the pinning operation. The potential difference between the voltage V_(FD(ij)) of the charge-detection portion FD_((i,j)) and the photogate voltage VPG is further decreased, since the value in the readout period is kept at the beginning of the storage period, and the potential V_(FD(ij)) of the charge-detection portion FD_((i, j)) is decreased in association with the subsequent accumulation of the signal charges. The second voltage V_((rd)) and the first voltage V_((pin)) may be other values at which the charge-detection margin can be ensured during the readout operation, and the pinning operation can be implemented during the storage operation, other than the values as described above. Both of the first voltage V_((pin)) and the second voltage V_((rd)) transmitted from the photogate scanner 21 can be generated by a scheme with a gradual shift, which is accomplished using conventionally-known level shifters.

In the photogate image sensor according to the second embodiment illustrated in FIG. 9, the drive signals for controlling the photogate voltage VPG are delivered to the photogate drive-lines DPG_((i)) and DPG_((i+1)) in units of rows so as to change the voltage applied to the photogate PG_((i, j)) per readout row. The respective photogate drive-lines DPG_((i)) and DPG_((i+1)) are selected by a vertical scanning circuit, and the all photogates PG_((i,j)) are driven so as to be shifted to a higher-level voltage in the readout period and shifted to a lower voltage in the storage period than the voltage in the readout period.

FIG. 11 is a timing diagram illustrating a drive timing focusing on the photogate drive-lines DPG_((i)) and DPG_((i+1)), the reset drive-lines DRT_((i)) and DRT_((i+1)), and the selection drive-lines DSL_((i)) and DSL_((i+1)) in the i-th and (i+1)-th rows, among the drive-lines extending in the horizontal direction in FIG. 9. The symbol “1H” represents a row-readout period, and the symbol “1V” represents a frame-readout period, on the assumption that the readout operation is carried out in order of row by row.

First, in the pixel Q_(ij) in the i-th row, the photo-electric conversion and storage operation in which the photogate PG_((i,j)) is set at the first voltage V_((pin)) is carried out in the storage period Storage(i). The selection drive-line DSL_((i)) of the select-transistor scanner 23 is then shifted to a higher-level voltage in the readout period Read(i), so that the pixel signal is read out to the output line in the readout period Read(i) in the pixel Q_(ij) in the i-th row. The photogate drive-line DPG_((i)) of the photogate scanner 21 is shifted to the second voltage V_((rd)) slightly before the readout operation, and the reset drive-line DRT_((i)) of the reset-transistor scanner 22 is shifted to a higher-level voltage at the intermediate stage of the readout period, so that the charge-readout region 8 is reset.

Immediately before the reset operation, a signal Sig_((i)) of the signal charges having been accumulated in the charge-detection portion FD_((i, j)) is read out from the charge-readout region 8. Immediately after the reset operation, a signal Res_((i)) at the reset level in which the signal charges of the charge-detection portion FD_((i, j)) are exhausted is read out from the charge-readout region 8. The signals are then subjected to correlated double sampling (CDS) in the readout circuit 24 which reads a difference between the signal Sig_((i)) of the signal charges accumulated and the signal Res_((i)) at the reset level, so as to obtain net signals. Although the surface potential of the shield region 6 cannot be pinned during the readout period Read(i), the readout period Read(i) is significantly shorter than the frame period (1V), so that an influence of a dark current generated during the readout period Read(i) can be ignored as described above.

The readout period is transferred to the storage period after the readout operation, and the photogate drive-line DPG_((i)) of the photogate scanner 21 is changed to the first voltage V_((pin)) at which the potential of the photogate PG_((i, j)) is pinned. The charge-readout region 8 of the charge-detection portion FD_((i,j)) is in the floating state during the period other than the interval in which the reset drive-line DRT_((i)) of the reset-transistor scanner 22 is at the higher-level voltage in the readout period. Therefore, when the photogate drive-line DPG_((i)) of the photogate scanner 21 is changed from the second voltage V_((rd)) at the higher-level voltage in the readout period to the first voltage V_((pin)) at the lower-level voltage in the storage period, the voltage level of the charge-readout region 8 is also shifted to the lower-level voltage. Accordingly, the potential difference between the charge-detection portion FD_((i,j)) and the charge-readout region 8 remains a small value, so as to prevent electric field concentration and suppress a generation of a dark current. The timing at which the photogate drive-line DPG_((i)) is shifted between the first voltage V_((pin)) and the second voltage V_((rd)) is preferably in a period in which the selection drive-line DSL_((i)) is in an off state (at the lower-level voltage), as illustrated in FIG. 11, in order to prevent such a shift from having an influence on the signal-line.

Thereafter, the same operation as in the i-th row is repeated sequentially in the (i+1)th row, the (i+2)th row, the (i+3)th row, . . . per horizontal scanning period in the time direction, so as to carry out the readout operation for the entire pixel area in the photogate image sensor. The potential difference between the charge-readout region 8 and photogate PG_((i,j)) is kept at a small value in each row so as to prevent electric field concentration.

A change in the potential state of the respective pixels Q_(ij) in each of the readout period during the reset operation and the signal detection operation and the storage period during the photo-electric conversion and storage operation is described below with reference to FIGS. 10A and 10B. As illustrated in FIG. 101B, the second voltage V_((rd)) of the transparent electrode 14 of the photogate PG_((i,j)) is relatively high and the potential is deep during the readout period in which the signal is detected and read out. When the reset-transistor RT_((i, j)) is turned on, the potentials of the charge-detection portion FD_((i,j)) and the buried charge-generation region 5 below the photogate PG_((i,j)) are reset to a deep potential level Φpd (H) corresponding to the high potential.

When the second voltage V_((rd)) of the transparent electrode 14 of the photogate PG_((i, j)) and the reset-drain voltage VRD of the reset-transistor RT_((i, j)) are set to appropriate values with appropriate timing, the charges are accumulated also in the buried charge-generation region 5 below the photogate PG_((i, j)). The reset-transistor RT_((i,j)) is then turned off, so that the charges of the charge-detection portion FD_((i,j)) and the buried charge-generation region 5 below the photogate PG_((i, j)) are changed to a floating state. Although the following is the case in which the charges are also accumulated in a channel below the photogate PG_((i, j)), the present invention can be applicable to a case in which the charges are accumulated only in the charge-detection portion FD_((i, j)).

The pixel Q_(ij) is then changed to the photo-electric conversion and storage operation in the storage period. The photogate voltage VPG applied to the transparent electrode 14 of the photogate PG_((i,j)) is shifted to the first voltage V_((pin)) until the shield region 6 is pinned to be covered with holes. As illustrated in FIG. 10i A, in the storage period in which the signal charges are accumulated, since the charges accumulated in the charge-detection portion FD_((i,j)) and the buried charge-generation region 5 below the photogate PG_((i,j)) are in the floating state, the potential of the buried charge-generation region 5 is shifted to a relatively shallow level Φpd (L) in association with the potential change in the gate voltage of the photogate PG_((i, j)) due to the capacitive coupling between the photogate PG_((i, j)) and the buried charge-generation region 5 and the charge-detection portion FD_((i, j)). Although not illustrated in FIG. 10A, when the charges are accumulated only in the charge-detection portion FD_((i,j)), the potential of the charge-detection portion FD_((i,j)) can be shifted to a lower potential due to the capacitive coupling between the photogate PG_((i,j)) and the charge-detection portion FD_((i,j)).

Since the potential difference between the charge-detection portion FD_((i,j)) and the photogate PG_((i,j)) can remain small, a dark current caused on the surface of the shield region 6 in the photogate PG_((i, j)) is suppressed, the dark current is ascribable to the pinning state. And simultaneously, a dark current due to electric field concentration is also suppressed during the photo-electric conversion and storage operation. Then, as the potential returns to the state illustrated in FIG. 10B, the signal is read out at the beginning of the subsequent readout period and immediately before the reset operation and the net signal amount is obtained from the shift amount of the potential, which is changed from the reset level Φpd (H) due to the signal charges. The rest level Φpd (H) is obtained after the reset operation.

When the photogate voltage VPG is reset to the second voltage V_((rd) as illustrated in FIG. 10B, the charges can be accumulated in the channel of the photogate PG_((i, j)). Although the surface potential of the shield region 6 cannot be pinned when the photogate voltage VPG is the second voltage V_((rd)), the readout period in which the photogate voltage VPG is at the second voltage V_((rd)) is significantly shorter than the frame period, so that an influence of a dark current generated during the readout period can be ignored. The signal charges (electrons) photo-electrically converted in the photogate PG_((i, j)) are accumulated in the charge-readout region 8 and the photogate PG_((i, j)). Therefore, while the charge-voltage conversion gain is low and the voltage sensitivity is low because of a large capacitance of the detection portion, the amount of the charges to be accumulated can be increased.

The potential of the charge-readout region 8 after the reset operation in the readout period is finished is in the floating state. When the photogate voltage VPG is shifted to a lower-level voltage capable of the pinning operation after the readout period, as illustrated in FIG. 10A, the potential of the charge-readout region 8 is also shifted to a low potential. That is, the pinning operation is carried out in the photogate PG_((i,j)) during the photo-electric conversion and storage operation after the readout period, and the potential difference between the photogate PG_((i,j)) and the charge-detection portion FD_((i, j)) results in a small value. Accordingly, a dark current generated during the photo-electric conversion and storage operation can greatly be reduced.

As described above, the photogate image sensor according to the second embodiment can prevent electric field concentration in the charge-detection portion FD_((i, j)) to suppress a generation of a dark current while the charge-detection margin is ensured in the storage period even when the first voltage V_((pin)) approximate to zero volt is applied to the gate of the photogate PG_((i,j)) for pinning the potential, as in the case of the photogate image sensor according to the first embodiment.

Further, the pixel Q_(ij) according to the second embodiment uses the photogate scanner 21 to vary the photogate voltage VPG and divide one frame into the two periods at each row (i), so that the photogate voltage VPG is set at the second voltage V_((rd)) at a higher-level voltage during the readout period. Further, the voltage at the reset level is set at a higher-level voltage to reset the charge-readout region 8, so as to shift the charge-readout region 8 to a high potential. Accordingly, the charge-detection margin can be ensured, the potential difference between the photogate PG_((i, j)) and the charge-detection portion FD_((i,j)) can be decreased, electric field concentration during the readout period can be prevented, and an excessive dark current generated during the readout period can be suppressed.

The scheme of the second embodiment, in which the photogate voltage VPG is subjected to the clocking operation between the two voltage values, is also applicable to a case excluding the shield region 6 from the pixel Q_(ij), the schemes of omitting the shield region 6 will be described in fifth and seventh embodiments below. The reason why the shield region 6 can be omitted from the pixel Q_(ij) is that the potential difference between the charge-readout region 8 and the photogate PG_((i,j)) can be decreased since the photogate PG_((i,j)) is at a higher-level voltage during the charge readout for higher-level voltage of the charge-readout region 8, and the potential of the charge-readout region 8 in the floating state can also be decreased even when the photogate voltage VPG is decreased to a lower level during the charge storage, and therefore the potential difference between the charge-readout region 8 and the photogate PG_((i, j)) is kept at a small value.

Third Embodiment

A photogate-pixel Qa_(ji) according to a third embodiment differs from the pixel Q_(ij) pertaining to the first embodiment in that the photogate PG_((i, j)) and the charge-detection portion FD_((i, j)) are each delineated into an annular form in a planar pattern, as illustrated in FIG. 12. As illustrated in FIGS. 12 and 13, a reset-drain region 7 a, a reset-gate electrode 12 a, a charge-readout region 8 a, a buried charge-generation region 5 a, a shield region 6 a, and a transparent electrode 14 a above the buried charge-generation region 5 a and the shield region 6 a are concentrically arranged sequentially from the center toward the outside.

The pixel Qa_(ij) according to the third embodiment includes the transparent electrode 14 a implementing the photogate PG_((i, j)), the charge-readout region 8 a implementing the charge-detection portion FD_((i, j)) arranged adjacent to the photogate PG_((i, j)), and the reset-gate electrode 12 a and the reset-drain region 7 a serving as a reset-transistor for resetting a potential of the charge-readout region 8 a. Although not illustrated in FIG. 12 or FIG. 13, the pixel Qa_(ij) according to the third embodiment includes an amplification-transistor for amplifying a potential change of the charge-readout region 8 a, and a select-transistor for selecting an output of the amplification-transistor.

As illustrated in FIG. 13, the pixel Qa_(ij) according to the third embodiment includes a p-type supporting-layer 1 a, and a gate insulating-film 4 a contacted with an upper surface of the supporting-layer 1 a. The n-type buried charge-generation region 5 a is buried in a part of an upper portion of the base-body portion 1 a. The shield region 6 a is buried in an upper portion of the buried charge-generation region 5 a and in contact with the gate insulating-film 4 a. The transparent electrode 14 a delineated into an annular form in a planar pattern is stacked on the gate insulating-film 4 a and allocated above the buried charge-generation region 5 a and the shield region 6 a.

As illustrated in FIG. 12, the pixel Qa_(ij) according to the third embodiment has a rectangular shape in a planar pattern, and the annular photogate PG_((i,j)) is arranged in the rectangular pixel Qa_(ij). FIG. 12 illustrates the upper surface of the pixel Qa_(ij), while the illustration of the gate insulating-film 4 a is omitted. As illustrated in FIG. 13, a p-type buried pixel-isolation region 2 a is buried in the upper portion on the peripheral side of the supporting-layer 1 a in the pixel Qa_(ij), and a p⁺-type joint-region 3 a having a higher impurity concentration than the buried pixel-isolation region 2 a is buried in a part of an upper portion of the buried pixel-isolation region 2 a and in contact with the gate insulating-film 4 a to serve as a channel-stop region. Since the respective pixels Qa_(ij) are isolated from each other by the p-type buried pixel-isolation regions 2 a and the p⁺-type joint-regions 3 a, a pixel-isolation oxide film (not illustrated), which tends to be deteriorated by irradiation of gamma rays, can be isolated from the buried charge-generation region 5 a.

A p-type well region 11 a having the same impurity concentration as the buried pixel-isolation region 2 a is buried in the upper portion at a central area of the supporting-layer 1 a in the pixel Qa_(ij) at the same depth as the buried pixel-isolation region 2 a. The n⁺-type reset-drain region 7 a having a higher impurity concentration than the buried charge-generation region 5 a is buried in a part of an upper portion at the central area of the well-region 11 a and in contact with the gate insulating-film 4 a. The n⁺-type charge-readout region 8 a having a higher impurity concentration than the buried charge-generation region 5 a is buried in the region across a part of the upper portion of the well region 11 a and a part of the upper portion of the buried charge-generation region 5 a and in contact with the gate insulating-film 4 a. The p-type well region 11 a and the p-type buried pixel-isolation region 2 a may be buried as a common region by the same process, so as to simplify the manufacturing process. The p-type buried pixel-isolation region 2 a and the p-type well region 11 a are not necessarily buried at the same depth or do not necessarily have the same impurity concentration if the simplification of the manufacturing process is not taken into account.

The reset-gate electrode 12 a delineated into an annular form in a planar pattern is stacked on the gate insulating-film 4 a and allocated above the well region 11 a between the reset-drain region 7 a and the charge-readout region 8 a. The structures of the layers or regions in the photogate image sensor according to the third embodiment are identical to the structures of the layers or regions denoted by the same reference numerals in the photogate image sensor pertaining to the first embodiment, and overlapping explanations thereof are thus not repeated below.

The pixel Qa_(ij) according to the third embodiment can be substituted for the pixel Q_(ij) pertaining to the first embodiment illustrated in FIG. 1, and the operations of the photogate image sensor according to the third embodiment are similar to the operations of the photogate image sensor pertaining to the first embodiment as described with reference to FIG. 6. Alternatively, the pixel Qa_(ij) according to the third embodiment can be substituted for the pixel Q_(ij) pertaining to the second embodiment illustrated in FIG. 9, and the operations of the photogate image sensor according to the third embodiment are similar to the operations of the photogate image sensor pertaining to the second embodiment as described with reference to FIG. 11.

The photogate image sensor according to the third embodiment applies the voltage approximate to zero volt to the gate of the photogate PG_((i,j)) so that the potential is pinned while the charge-detection margin is ensured, so as to prevent electric field concentration in the charge-detection portion FD_((i, j)) to suppress a generation of a dark current, as in the case of the photogate image sensors of the first and second embodiments.

Fourth Embodiment

As illustrated in FIG. 14, a photogate image sensor according to a fourth embodiment of the present invention includes a pixel area in which a plurality of photogate-pixels Qb_(ij) each including a charge-transfer mechanism is arranged in a matrix form, and a peripheral circuit including a transfer-transistor scanner 31, a reset-transistor scanner 32, a select-transistor scanner 33, a readout circuit 34, and the like disposed at the periphery of the pixel area.

As illustrated in FIGS. 15, 16A, and 16B, the pixel Qb_(ij) according to the fourth embodiment is similar to the pixel Q_(ij) pertaining to the first embodiment in the photogate structure including a p-type supporting-layer 1 b, an n-type buried charge-generation region 5 b buried in an upper portion of the supporting-layer 1 b to implement a photodiode with the supporting-layer 1 b, a p-type shield region 6 b buried at an upper surface of the buried charge-generation region 5 b, a gate insulating-film 4 b contacted with an upper surface of the shield region 6 b, and a transparent electrode 14 b provided on the gate insulating-film 4 b. Similar to the structure of the pixel Q_(ij) pertaining to the first embodiment, the pixel Qb_(ij) of the fourth embodiment further includes an n-type charge-readout region 8 b having a higher impurity concentration than the buried charge-generation region 5 b and buried in the upper portion of the base-body portion 1 b, an n-type reset-drain region 7 b having a higher impurity concentration than the buried charge-generation region 5 b and buried separately from the charge-readout region 8 b, and a reset-gate electrode 12 b stacked on the gate insulating-film 4 b and allocated above the supporting-layer 1 b between the charge-readout region 8 b and the reset-drain region 7 b.

However, the pixel Qb_(ij) according to the fourth embodiment differs from the pixel Q_(ij) pertaining to the first embodiment, in a feature such that the pixel Qb_(ij) of the fourth embodiment further includes a transfer-gate electrode 15 b allocated above the supporting-layer 1 b and the gate insulating-film 4 b between the transparent electrode 14 b and the charge-readout region 8 b and adjacent to the transparent electrode 14 b with a gap d provided between the transfer-gate electrode 15 b and the transparent electrode 14 b. As described below, when a voltage applied to the transfer-gate electrode 15 b is shifted from a lower-level voltage to a higher-level voltage, signal charges are transferred from the buried charge-generation region 5 b to the charge-readout region 8 b. The gap d between the transfer-gate electrode 15 b and the transparent electrode 14 b may be designed as small as possible.

The n-type buried charge-generation region 5 b is isolated from an element-isolation insulating-film 9 b via a p-type buried pixel-isolation region 2 b, and a p⁺-type joint-region 3 b having a higher impurity concentration than the buried pixel-isolation region 2 b is buried in a part of the upper portion of the buried pixel-isolation region 2 b. That is, the end portion of the p-type shield region 6 b is electrically connected to the p-type buried pixel-isolation region 2 b buried at the pixel periphery via the p⁺-type joint-region 3 b. Accordingly, the end portion of the p-type shield region 6 b is electrically short-circuited by the p-type supporting-layer 1 b via the p⁺-type joint-region 3 b. FIG. 17 is a diagram illustrating a potential distribution of the pixel Qb_(ij) according to the fourth embodiment in cross section corresponding to FIG. 16A.

The transfer-transistor scanner 31 illustrated in FIG. 14 applies, to the transfer-gate electrode 15 b in the respective pixels Qb_(ij), a first voltage set at a lower-level voltage for accumulating signal charges generated by photo-electric conversion in the buried charge-generation region 5 b, and a second voltage set at a higher-level voltage for transferring the charges accumulated in the buried charge-generation region 5 b to the charge-readout region 8 b. A voltage VPG of a constant value (DC) approximate to zero volt is applied to the transparent electrode 14 b in the respective pixels Qb_(ij) so that the surface potential of the p-type shield region 6 b is pinned by majority carriers (holes).

FIG. 18 is a timing chart illustrating a drive timing, focusing on the transfer drive-lines DTX_((i)) and DTX_((i+1)), the reset drive-lines DRT_((i)) and DRT_((i+1)), and the selection drive-lines DSL_((i)) and DSL_((i+1)) in the i-th and (i+1)-th rows, among the drive-lines extending in the horizontal direction in FIG. 14. The symbol “1H” represents a row-readout period, and the symbol “1V” represents a frame-readout period, on the assumption that the readout operation is carried out in order of row.

In the pixel Qb_(ij) in the i-th row, the photo-electric conversion and storage operation, in which the selection-gate signal DSL_((i)) is set at a lower-level voltage to separate the pixel from the signal-line, is carried out in the storage period Storage(i). Simultaneously, in the storage period Storage(i), the transfer-gate signal DTX(i) is set at a lower-level voltage so as to carry out the photo-electric conversion and storage operation. When the signal charges are accumulated in the photogate PG_((i, j)), the voltage VPG of the constant value (DC) approximate to zero volt is applied to the transparent electrode 14 b so that the surface potential of the p-type shield region 6 b is pinned by majority carriers (holes), as in the case illustrated in FIG. 5.

The selection-gate signal DSL(i) is sifted to a higher-level voltage so that the pixel is read out to the signal-line in the readout period Read(i), and a reset-gate signal DRT(i) is shifted to the higher-level voltage at the beginning of the readout period Read(i) to read out the signal Res(i). Subsequently, the transfer-gate signal DTX(i) is shifted to the higher-level voltage at the intermediate stage of the readout period Read(i), and the signal Sig(i) is read out immediately after the transfer-gate signal DTX(i) is shifted to the higher-level voltage. The signals are then subjected to correlated double sampling (CDS) in the readout circuit 34 which reads a difference between the signal Res_((i)) at the reset level and the signal Sig_((i)) of the signal charges accumulated, so as to obtain net signals in which reset noise as well as threshold variation of the amplification-transistor SF_((i, j)) is removed.

As illustrated in FIG. 19A, the voltage applied to the transfer-gate electrode 15 i is shifted to a lower-level voltage during the photo-electric conversion, and the signal charges generated by the photo-electric conversion are accumulated in the buried charge-generation region 5 b. As illustrated in FIG. 19B, the voltage applied to the transfer-gate electrode 15 b is shifted to the higher-level voltage during the charge transfer, and the charges accumulated in the buried charge-generation region 5 b are transferred to the charge-readout region 8 b.

In the photogate image sensor according to the fourth embodiment, the voltage approximate to zero volt is applied to the gate of the photogate PG_((i, j)) so that the potential is pinned while the charge-detection margin is ensured, so as to suppress a generation of a dark current, as in the case of the first to third embodiments.

A structure in which the transparent electrode 14 b is not provided on the upper surface of the shield region 6 b in the pixel Qb_(ij) according to the fourth embodiment illustrated in FIGS. 15, 16A, and 16B, is known as “a buried photodiode structure”. As in the case of the pixel Qb_(ij) according to the fourth embodiment, the specific structure characterized in that the transparent electrode 14 b is provided on the upper surface of the shield region 6 b via the gate insulating-film 4 b is not preferably applied to a generic image sensor used under normal conditions, because polysilicon typically used for an electrode material tends to absorb a shorter wavelength light such as blue light to degrade color reproducibility. In addition, as described in the first embodiment, the shield region 6 b itself is occasionally referred to as “a virtual electrode”, and an arrangement of a transparent electrode on such a virtual electrode does not follow the conventional technical common knowledge in the art. Further, when the transparent electrode 14 b is provided, another problem with the gap d provided between the transfer-gate electrode 15 and the transparent electrode 14 b is brought up upon processing. In contrast, although the light sensitivity for the shorter wavelength is reduced, the pixel Qb_(ij) of the fourth embodiment can prevent from the depletion in the surface of the shield region 6 b caused by radiation. That is, the pixel Qb_(ij) of the fourth embodiment can solve the problem of earlier technology, such that the dark current suddenly and greatly increases by radiation, ascribable to the depletion in the surface of the shield region 6 b by the radiation. Because the object of the pixel Qb_(ij) of the fourth embodiment is addressing to obtain a very high radiation immunity, while solving the technical problem upon processing of the gap due to the specific structure in which the transparent electrode 14 b is provided above the shield region 6 b. Therefore, the pixel Qb_(ij) according to the fourth embodiment can ensure the high radiation immunity, achieving the significant effectiveness.

Fifth Embodiment

As described above, each of the shield regions 6, 6 a, and 6 b as described in the first to fourth embodiments is occasionally referred to as “the virtual electrode” in an optical-detection element having a structure other than the photogate structure, and the arrangement of the transparent electrode 14, 14 a, or 14 b on such the virtual electrode does not follow the conventional technical common knowledge in the art. Thus, conventionally, the arrangement of the p-type shield region 6, 6 a, or 6 b on the upper surface of the buried charge-generation region 5, 5 a, or 5 b was considered an inappropriate scheme for the photogate structure.

Before arriving at the invention as described in the first to fourth embodiments, the inventors of the present invention had tried to find a solution to the problem of a significantly strong electric field caused at the boundary between the photogate and the charge-readout region 8, 8 a, or 8 b in a structure not including the shield region 6, 6 a, or 6 b by devising a design of the photogate scanner 21 as a peripheral circuit. A photogate image sensor according to a fifth embodiment includes a pixel area in which a plurality of photogate-pixels Qc_(ij) is arranged in a matrix form, and a peripheral circuit having the photogate scanner 21, the reset-transistor scanner 22, the select-transistor scanner 23, and the like disposed at the periphery of the pixel area, as in the case of the photogate image sensor pertaining to the second embodiment illustrated in FIG. 9.

As illustrated in FIGS. 20 and 21, the pixel Qc_(ij) according to the fifth embodiment includes a photogate PG_((i, j)) including a p-type supporting-layer 1 c, an n-type buried charge-generation region 5 c buried in an upper portion of the supporting-layer 1 c, a gate insulating-film 4 c contacted with the buried charge-generation region 5 c, and a transparent electrode 14 c provided on the gate insulating-film 4 c, and an n-type charge-readout region 8 c having a higher impurity concentration than the buried charge-generation region 5 c and connected to the buried charge-generation region 5 c. The pixel Qc_(ij) according to the fifth embodiment differs from the pixel Q_(ij) pertaining to the first embodiment in excluding the shield region 6, which is provided in the upper portion of the buried charge-generation region 5 and in contact with the gate insulating-film 4 in the pixel Q_(ij) illustrated in FIGS. 2, 3A, and 3B. The photogate PG_((i, j)) in the pixel Qc_(ij) according to the fifth embodiment is implemented by a region in which the transparent electrode 14 c is allocated immediately above the buried charge-generation region 5 c via the thin gate insulating-film 4 c.

The photogate scanner 21 illustrated in FIG. 9 applies, to the transparent electrode 14 c of the respective pixels Qc_(ij) illustrated in FIGS. 20 and 21, a first voltage at which the surface potential at the interface between the buried charge-generation region 5 c and the gate insulating-film 4 c is pinned by minority carriers in the buried charge-generation region 5 c and a second voltage shifted from the first voltage in a direction in which the channel potential of the buried charge-generation region 5 c deepens. In particular, according to the timing chart as illustrated in FIG. 23, the photogate scanner 21 divides one frame into a “storage period” and a “readout period”, and applies, to the transparent electrode 14 c of the respective pixels Qc_(ij), the first voltage in the storage period and the second voltage in the readout period.

In the pixel Qc_(ij), signal charges generated in the storage period due to photo-electric conversion in the photogate PG_((i, j)) is read out from the charge-readout region 8 c in the readout period. In the pixel Qc_(ij) according to the fifth embodiment, as illustrated in FIG. 21, when the first voltage is applied to the transparent electrode 14 c in the storage period, an inversion layer 51 c is induced by holes of minority carriers immediately below the gate insulating-film 4 c.

As described above, when gamma rays are irradiated to the semiconductor element, a large number of electron-hole pairs are generated in the oxide film on the semiconductor surface, and positive charges concentrate in the oxide film on the semiconductor surface. As a result, the semiconductor surface is depleted to cause a large dark current. In the pixel Qc_(ij) according to the fifth embodiment, since the buried charge-generation region 5 c is the n-type, the inversion layer 51 c is induced by a large number of holes on the surface of the buried charge-generation region 5 c immediately below the transparent electrode 14 c in the storage period. Since the surface potential of the buried charge-generation region 5 c is pinned by the holes in the storage period, the interface states at the interface between the gate insulating-film 4 c and the buried charge-generation region 5 c are deactivated. As illustrated in FIG. 21, since the thin gate insulating-film 4 c is only provided above the buried charge-generation region 5 c in the photogate structure according to the fifth embodiment, an absolute quantity of the holes generated in the gate insulating-film 4 c is small. Accordingly, the pixel Qc_(ij) according to the fifth embodiment can greatly improve the radiation immunity in association with the deactivation of the interface states described above, as in the case of the pixels Q_(ij), Qa_(ij), and Qb_(ij) according to the first to fourth embodiments.

As illustrated in FIG. 20, the pixel Qc_(ij) according to the fifth embodiment may be designed to have a rectangular shape in a planar pattern, for example. FIG. 20 illustrates an upper surface of the pixel Qc_(ij), while the illustration of the gate insulating-film 4 c is omitted. The FIG. 20 omits the amplification-transistor SF_((i,j)) and the select-transistor SL_((i, j)) illustrated in FIG. 9. Although a part of a p-type buried pixel-isolation region 2 c is exposed on the left side in cross section illustrated in FIG. 21, the buried pixel-isolation region 2 c is buried in the upper portion of the supporting-layer 1 c at the periphery of the pixel Qc_(ij), as illustrated in FIG. 20. A p-type joint-region 3 c having a higher impurity concentration than the buried pixel-isolation region 2 c is buried in a part of the upper portion of the buried pixel-isolation region 2 c and in contact with the gate insulating-film 4 c so as to surround the pixel Qc_(ij).

As illustrated on the right side in FIGS. 20 and 21, a p-type well region 11 c is buried in the upper portion of the supporting-layer 1 c in the pixel Qc_(ij) at the same depth as the buried pixel-isolation region 2 c. An n-type reset-drain region 7 c having a higher impurity concentration than the buried charge-generation region 5 c is buried in a part of an upper portion of the well region 11 c and in contact with the gate insulating-film 4 c. In general, the p-type well region 11 c and the p-type buried pixel-isolation region 2 c are buried as a common region.

The n-type charge-readout region 8 c having a higher impurity concentration than the buried charge-generation region 5 c is buried between the well region 11 c and the buried charge-generation region 5 c and in contact with the gate insulating-film 4 c. A reset-gate electrode 12 c is stacked on the gate insulating-film 4 c and allocated above the well region 11 c between the reset-drain region 7 c and the charge-readout region 8 c so as to implement a reset-transistor RT_((i, j)) having a structure equivalent to an nMOS transistor. The higher-level voltage is applied to the reset-gate electrode 12 c in the reset-transistor RT_((i, j)) to exhaust charges of the charge-readout region 8 c to the reset-drain region 7 c.

In the storage period in the photogate image sensor according to the fifth embodiment, the first voltage V_((pin)) applied to the photogate PG_((i, j)) is set at approximately −1 volt to −2 volts according to the one-dimensional calculation as described in the photogate image sensor pertaining to the second embodiment. At the beginning of the storage period, the potential difference between the voltage of the charge-detection portion FD_((i,j)) and the photogate voltage VPG is kept the value at the readout period as described above, and the potential of the charge-detection portion FD_((i, j)) is further decreased in association with the subsequent accumulation of the signal charges. The second voltage V_((rd)) and the first voltage V_((pin)) may be other values at which the charge-detection margin can be ensured during the readout operation, and the pinning operation can be implemented during the storage operation, other than the values as described above.

Both of the first voltage V_((pin)) and the second voltage V_((rd)), which are transmitted from the photogate scanner 21, can be generated in a stepwise shift by use of conventionally-known level shifters. The level shifters included in the photogate scanner 21 can be implemented by a logic circuit in which a plurality of nMOS transistors and pMOS transistors are combined, as illustrated in FIG. 22. The circuit in FIG. 22 is illustrated with a case of generating the second voltage V_((rd)) set at zero volt and the first voltage V_((pin)) set at −2 volts.

When a pulse in which a lower-level voltage is zero volt and the higher-level voltage is 1.5 volts is entered to the input side of the circuit on the left side as illustrated in FIG. 22, for example, the level shifter (1) shifts the lower-level input voltage from zero volt to −2 volts, so that a pulse in which the lower-level voltage is the first voltage V_((pin)) can be transferred to the output side of the circuit on the right side as illustrated in FIG. 22. The voltage on the higher-level voltage side remains 1.5 volts at this stage. Subsequently, the level shifter (2) shifts the higher-level input voltage from 1.5 volts to zero volt, so as to transmit a pulse in which the higher-level voltage is the second voltage V_((rd)) while the lower-level voltage side remain the first voltage V_((pin)).

In the lower half region on the nMOS transistor side in the circuit illustrated in FIG. 22, a first p-well region PW1 on the preceding side and a second p-well region PW2 on the following side are aligned in the lateral direction. Since the second p-well region PW2 is −2 volts while the first p-well region PW1 is zero volt, a deep n-well region DNW is provided between the nMOS transistor and a p-type substrate having a ground voltage of zero volt. In the upper half region on the pMOS transistor side in the circuit illustrated in FIG. 22, a normal n-well region NW corresponding to 1.5 volts is provided.

FIG. 23 is a timing chart illustrating a drive timing focusing on the photogate drive-lines DPG_((i)) and DPG_((i+1)), the reset drive-lines DRT_((i)) and DRT_((i+1)), and the selection drive-lines DSL_((i)), and DSL_((i+1)) in the i-th and (i+1)-th rows, among the drive-lines extending in the horizontal direction in FIG. 9. First, in the pixel Qc_(ij) in the i-th row, the selection drive-line DSL_((i)) of the select-transistor scanner 23 is shifted to the higher-level voltage in the readout period so that the pixel signal is read out to the output line. The photogate drive-line DPG_((i)) of the photogate scanner 21 is shifted to the higher-level voltage slightly before the readout operation, and the reset drive-line DRT_((i)) of the reset-transistor scanner 22 is shifted to the higher-level voltage at the intermediate stage of the readout period, so that the charge-readout region 8 c is reset.

Immediately before the reset operation, a signal Sig_((i)) of the signal charges having been accumulated in the charge-detection portion FD_((i, j)) is read out from the charge-readout region 8 c. Immediately after the reset operation, a signal Res_((j)) at the reset level in which the signal charges of the charge-detection portion FD_((i, j)) are exhausted is read out from the charge-readout region 8 c. The signals are then subjected to correlated double sampling (CDS) in the readout circuit 24 which reads a difference between the signal Sig_((i)) of the signal charges accumulated and the signal Res_((i)) at the reset level, so as to obtain net signals.

The readout period is changed to the storage period after the readout operation, and the photogate drive-line DPG_((i)) of the photogate scanner 21 is changed to a value at a lower-level voltage at which the potential of the photogate PG_((i,j)) is pinned. FIG. 25 is a diagram illustrating a potential profile in a case in which a negative potential as the photogate voltage VPG is applied to the transparent electrode 14 c in the pixel Qc_(ij) according to the fifth embodiment in the storage period, and the surface potential of the photogate PG_((i,j)) is pinned. The inversion layer 51 c below the photogate PG_((i,j)) is in the pinned state in the storage period, so as to suppress a generation of a dark current at the surface and improve the radiation immunity. The portion having the deepest potential in the buried charge-generation region 5 c serves as a channel 52 c.

The charge-readout region 8 c of the charge-detection portion FD_((i,j)) is in the floating state during the period other than the period in which the reset drive-line DRT_((i)) of the reset-transistor scanner 22 is at the higher-level voltage in the readout period. Therefore, when the photogate drive-line DPG_((i)) of the photogate scanner 21 is shifted from the higher-level voltage in the readout period to the lower-level voltage in the storage period, the voltage level of the charge-readout region 5 c is also shifted to the lower-level voltage. Accordingly, the potential difference between the charge-detection portion FD_((i, j)) and the charge-readout region 8 c remains a small value, so as to prevent electric field concentration and suppress a generation of a dark current. The timing at which the photogate drive-line DPG_((i)) is shifted between the first voltage V_((pin)) and the second voltage V_((rd)) is preferably in a period in which the selection drive-line DSL_((i)) is in an off state (at the lower-level voltage), as illustrated in FIG. 23, in order to prevent such a shift from having an influence on the signal-line.

Subsequently, the pixel Qc_(ij) in the (i+1)th row is driven in the same manner as in the i-th row per horizontal scanning period in the time direction. Similarly, the same operation as in the i-th row is repeated sequentially in the (i+2)th row, the (i+3)th row, . . . per horizontal scanning period in the time direction, so as to carry out the readout operation for the entire pixel area in the photogate image sensor. The potential difference between the charge-readout region 5 c and photogate PG_((i,j)) is kept at a small value in each row, so as to prevent electric field concentration.

A change in the potential state of the respective pixels Qc_(ij) in each of the readout period during the reset operation and the signal detection operation and the storage period during the photo-electric conversion and storage operation is described below with reference to FIG. 24. As illustrated in FIG. 24A, the voltage of the transparent electrode 14 c of the photogate PG_((i,j)) is relatively high and the potential is deep during the readout period in which the signal is detected and read out. When the reset-transistor RT_((i,j)) is turned on, the potentials of the charge-detection portion FD_((i,j)) and the channel 52 c generated in the buried charge-generation region 5 c below the photogate PG_((i,j)), are reset to a deep level Φpd (H) When the gate voltage of the photogate PG_((i,j)) and the reset-drain voltage VRD of the reset-transistor RT_((i,j)) are set as appropriate values at an appropriate timing, the charges are also accumulated in the channel 52 c below the photogate PG_((i,j)). The reset-transistor RT_((i, j)) is then turned off, so that the charges of the charge-detection portion FD_((i,j)) and the channel 52 c below the photogate PG_((i,j)) are changed to a floating state. Although the following is the case in which the charges are also accumulated in the channel 52 c below the photogate PG_((i,j)), the present invention can be applicable to a case in which the charges are accumulated only in the charge-detection portion FD_((i,j)).

Subsequently, the photogate voltage VPG applied to the transparent electrode 14 c of the photogate PG_((i,j)) is then shifted to a lower-level voltage until the inversion layer 51 c induced at the surface of the buried charge-generation region 5 c is pinned to be covered with holes. The pixel Qc_(ij) is then shifted to the photo-electric conversion and storage operation. As illustrated in FIG. 24B, in the storage period in which the signal charges are accumulated, since the charges accumulated in the charge-detection portion FD_((i,j)) and the channel 52 c below the photogate PG_((i,j)) are in the floating state, the potential of the channel 52 c is shifted to a relatively shallow level Φpd (L) in association with the potential change in the gate voltage of the photogate PG_((i,j)) due to the capacitive coupling between the photogate PG_((i, j)) and the channel 52 c and the charge-detection portion FD_((i, j)). Although not illustrated in FIG. 24B, when the charges are accumulated only in the charge-detection portion FD_((i,j)), the potential of the charge-detection portion FD_((i,j)) can be shifted to a lower potential due to the capacitive coupling between the photogate PG_((i,j)) and the charge-detection portion FD_(i,j).

Since the potential difference between the charge-detection portion FD_((i,j)) and the photogate PG_((i, j)) can remain small, a dark current caused at the surface of the channel 52 c below the photogate PG_((i,j)) derived from the pinning state is suppressed, and a dark current due to electric field concentration is also suppressed during the photo-electric conversion and storage operation. The signal is read out at the beginning of the subsequent readout period and immediately before the reset operation. That is, the potential returns to the state illustrated in FIG. 24A, so as to obtain the net signal amount from the shift amount of the potential shifted from the reset level Φpd (H) due to the signal charges.

In the pixel Qc_(ij) according to the fifth embodiment, the photogate voltage VPG is varied, and the photogate voltage VPG is set at the higher-level voltage during the readout period. Further; the voltage at the reset level is set at the higher-level voltage to reset the charge-readout region 8 c, so as to shift the charge-readout region 8 c to a high potential. Accordingly, while the shield field 6, 6 a, or 6 b described in the first to fourth embodiments is excluded in the pixel Qc_(ij), the charge-detection margin can be ensured, the potential difference between the photogate PG_((i, j)) and the charge-detection portion FD_((i,j)) can be decreased, electric field concentration during the readout period can be prevented, and an excessive dark current generated during the readout period can be suppressed.

The potential of the charge-readout region 8 c after the reset operation in the readout period is finished is in the floating state. When the photogate voltage VPG is shifted to a lower-level voltage capable of the pinning operation after the readout period, the potential of the charge-readout region 8 c is also shifted to a low potential. That is, the pinning operation is carried out in the photogate PG_((i, j)) during the photo-electric conversion and storage operation after the readout period, and the potential difference between the photogate PG_((i,j)) and the charge-detection portion FD_((i,j)) results in a small value. Accordingly, a dark current generated during the photo-electric conversion and storage operation can greatly be reduced.

The photogate image sensor according to the fifth embodiment does not include the shield field 6, 6 a, or 6 b illustrated in the first to fourth embodiments, but uses the photogate scanner 21 to divide one frame into the two periods so as to prevent electric field concentration in the charge-detection portion FD_((i, j)) to suppress a generation of a dark current while the charge-detection margin is ensured even when the negative voltage is applied to the gate of the photogate PG_((i,j)) for pinning the potential.

Sixth Embodiment

A photogate image sensor according to a sixth embodiment includes a pixel area in which a plurality of photogate-pixels Qd_(ij) is arranged in a matrix form, and a peripheral circuit having the photogate scanner 21, the reset-transistor scanner 22, the select-transistor scanner 23, and the like disposed at the periphery of the pixel area, as in the case of the photogate image sensor pertaining to the second embodiment illustrated in FIG. 9. As illustrated in FIGS. 26 and 27, the photogate image sensor according to the sixth embodiment differs from the photogate image sensor of the fifth embodiment in that the photogate PG_((i,j)) and the charge-detection portion FD_((i,j)) are each delineated into an annular form in a planar pattern, but has the same structure as the photogate image sensor pertaining to the fifth embodiment not including the shield region 6, 6 a, or 6 b described in the first to fourth embodiments.

The pixel Qd_(ij) according to the sixth embodiment includes a transparent electrode 14 d implementing the photogate PG_((i, j)), a charge-readout region 8 d implementing the charge-detection portion FD_((i, j)) arranged adjacent to the photogate PG_((i, j)), and a reset-gate electrode 12 d and a reset-drain region 7 d serving as a reset-transistor for resetting a potential of the charge-readout region 8 d. The pixel Qd_(ij) according to the sixth embodiment further includes an amplification-transistor for amplifying a potential change of the charge-readout region 8 d, and a select-transistor for selecting an output of the amplification-transistor, although not illustrated in FIG. 26 or FIG. 27.

As illustrated in FIG. 27, the pixel Qd_(ij) according to the sixth embodiment includes a p-type supporting-layer 1 d, and a gate insulating-film 4 d contacted with an upper surface of the supporting-layer 1 d. An n-type buried charge-generation region 5 d is buried in an upper portion of the supporting-layer 1 d and in contact with the gate insulating-film 4 d. An inversion layer 51 d is induced at an upper portion of the buried charge-generation region 5 d. A transparent electrode 14 d delineated into an annular form in a planar pattern is deposited on the gate insulating-film 4 d and allocated above the buried charge-generation region 5 d.

As illustrated in FIG. 26, the pixel Qd_(ij) according to the sixth embodiment has a rectangular shape in a planar pattern, and the annular photogate PG_((i,j)) is arranged in the rectangular pixel Qd_(ij). FIG. 26 illustrates the upper surface of the pixel Qd_(ij), while the illustration of the gate insulating-film 4 d is omitted. As illustrated in FIG. 27, a p-type buried pixel-isolation region 2 d is buried in the upper portion on the peripheral side of the supporting-layer 1 d in the pixel Qd_(ij). A p-type joint-region 3 d having a higher impurity concentration than the buried pixel-isolation region 2 d is buried in a part of an upper portion of the buried pixel-isolation region 2 d and in contact with the gate insulating-film 4 d to serve as a channel-stop region.

A p-type well region 11 d is buried in the upper portion at a central area of the supporting-layer 1 d in the pixel Qd_(ij) at the same depth as the buried pixel-isolation region 2 d. The n-type reset-drain region 7 d having a higher impurity concentration than the buried charge-generation region 5 d is buried in a part of an upper portion at a central area of the well-region 11 d and in contact with the gate insulating-film 4 d. The n-type charge-readout region 8 d having a higher impurity concentration than the buried charge-generation region 5 d is buried in the region across a part of the upper portion of the well region 11 d and a part of the upper portion of the buried charge-generation region 5 d and in contact with the gate insulating-film 4 d. The p-type well region 11 d and the p-type buried pixel-isolation region 2 d may be buried as a common region.

The reset-gate electrode 12 d delineated into an annular form in a planar pattern is stacked on the gate insulating-film 4 d and allocated above the well region 11 d between the reset-drain region 7 d and the charge-readout region 8 d. The structures of the layers or regions in the photogate image sensor according to the sixth embodiment are identical to the structures of the layers or regions denoted by the same reference numerals in the photogate image sensor pertaining to the fifth embodiment, and overlapping explanations thereof are thus not repeated below.

The operations of the photogate image sensor according to the sixth embodiment are similar to the operations of the photogate image sensor pertaining to the fifth embodiment as described with reference to FIG. 23. As illustrated in FIG. 28A, in the pixel Qd_(ij) according to the sixth embodiment, the voltage of the transparent electrode 14 d of the photogate PG_((i,j)) is relatively high and the potential is deep during the readout period in which the signal is detected and read out. When the reset-transistor is turned on, the potentials of the charge-detection portion FD_((i,j)) and a channel 52 d below the photogate PG_((i,j)) are reset to a deep level Φpd (H), as in the case of the pixel Qc_(ij) according to the fifth embodiment.

The reset-transistor is then turned off, so that the charges of the charge-detection portion FD_((i, j)) and the channel 52 d below the photogate PG_((i, j)) are changed to a floating state. In the storage period, the photogate voltage VPG applied to the transparent electrode 14 d of the photogate PG_((i, j)) is shifted to a lower-level voltage until the inversion layer 51 d induced at the surface of the buried charge-generation region 5 d is pinned to be covered with holes, and the pixel Qd_(ij) is then shifted to the photo-electric conversion and storage operation.

As illustrated in FIG. 28B, in the storage period in which the signal charges are accumulated, the potential of the channel 52 d is shifted to a relatively shallow level Φpd (L), and the potential difference between the charge-detection portion FD_((i,j)) and the photogate PG_((i,j)) is kept at a small value, as in the case of the pixel Qc_(ij) according to the fifth embodiment. The photogate image sensor according to the sixth embodiment thus can achieve the effectiveness similar to the fifth embodiment, since the photogate image sensor according to the sixth embodiment not including the shield field 6, 6 a, or 6 b illustrated in the first to fourth embodiments uses the photogate scanner to divide one frame into the two periods, so as to prevent electric field concentration in the charge-detection portion FD_((i, j)) to suppress a generation of a dark current while the charge-detection margin is ensured even when the negative voltage is applied to the gate of the photogate PG_((i,j)), for pinning the potential.

Other Embodiments

While the present invention has been described above with reference to the first to sixth embodiments, it should be understood that discussion and Drawings which are incorporated herein are not intended to limit the present invention. Various alternative embodiments, examples, and operational techniques will be apparent to those skilled in the art from the description above.

For example, although the photogate PG_((i,j)) and the charge-detection portion FD_((i,j)) each delineated into an annular form in a planar pattern which is substantially octagonal are illustrated in the pixel Qa_(ij) or Qd_(ij) according to the third or sixth embodiment, the annular form may be a tetragonal shape, a hexagonal shape, a decagonal shape, or other polygonal shapes. Alternatively, the annular form may be a circular or elliptic shape.

While the first to sixth embodiments above are illustrated with the case in which the signal charges are electrons and the transistor in the pixel Qa_(ij), Qb_(ij), Qc_(ij), or Qd_(ij) is the n-type, the present invention is not intended to be limited to the case in which the signal charges are electrons. The present invention is also applicable to a case in which the signal charges are holes and the transistor in the pixel Qa_(ij), Qb_(ij), Qc_(ij), or Qd_(ij) is the p-type when the polarity is reversed.

In the description of the first to sixth embodiments, although the two-dimensional photogate image sensor (area sensor) has been described as an example, the photogate image sensor of the present invention is not intended to be limited to the two-dimensional photogate image sensor only. For example, it can be easily understood from the contents of the disclosure that a one-dimensional photogate image sensor (line sensor) in which the pixels Q_(ij) are one-dimensionally aligned (i=1 or j=1) may be implemented using the array of one line, which is changed from the two-dimensional matrix illustrated in FIG. 1.

Naturally, the present invention includes many other embodiments not described herein. Therefore, the technical scope of the present invention is determined only by the present invention identification matters according to claims reasonable from the foregoing description. 

What is claimed is:
 1. An optical-detection element comprising: a supporting-layer of a first conductivity type; a buried charge-generation region of a second conductivity type buried in an upper portion of the supporting-layer to implement a photodiode with the supporting-layer; a shield region of the first conductivity type having an impurity concentration higher than the supporting-layer and buried at an upper surface of the buried charge-generation region; a gate insulating-film contacted with an upper surface of the shield region; a transparent electrode provided on the gate insulating-film just above the buried charge-generation region, configured to implement a photogate structure, through which a light is incident on the buried charge-generation region; a well region of the first conductivity type having a higher impurity concentration than the supporting-layer and buried in the upper portion of the supporting-layer; and a charge-readout region of the second conductivity type having a higher impurity concentration than the buried charge-generation region and buried in the upper portion of the supporting-layer at an edge of the well region toward the buried charge-generation region, wherein the impurity concentration of the shield region is set to a value such that an electrostatic potential at a surface side of the shield region is changeable by a voltage applied to the transparent electrode, and a surface potential of the shield region is pinned by charges of the first conductivity type by the electrostatic potential induced in the shield region.
 2. The optical-detection element of claim 1, further comprising: a reset-drain region of the second conductivity type having a higher impurity concentration than the buried charge-generation region and buried in an upper portion of the well region separately from the charge-readout region; and a reset-gate electrode stacked on the gate insulating-film and allocated above the well region between the charge-readout region and the reset-drain region.
 3. The optical-detection element of claim 2, wherein when a voltage is applied to the reset-gate electrode, charges accumulated in the charge-readout region are exhausted to the reset-drain region so as to reset the charge-readout region.
 4. The optical-detection element of claim 1, wherein the charge-readout region is in contact with the buried charge-generation region and the shield region.
 5. The optical-detection element of claim 1, wherein the charge-readout region is separated from the buried charge-generation region and the shield region, a transfer-gate electrode is further stacked on the gate insulating-film and allocated above the supporting-layer between the buried charge-generation region and the shield region and the charge-readout region, and when a voltage is applied to the transfer-gate electrode, signal charges are transferred from the buried charge-generation region to the charge-readout region.
 6. A solid-state imaging device in which a plurality of pixels is arranged, each of the plurality of pixels comprising: a supporting-layer of a first conductivity type; a buried charge-generation region of a second conductivity type buried in an upper portion of the supporting-layer to implement a photodiode with the supporting-layer; a shield region of the first conductivity type having an impurity concentration higher than the supporting-layer and buried at an upper surface of the buried charge-generation region; a gate insulating-film contacted with an upper surface of the shield region; a transparent electrode provided on the gate insulating-film just above the buried charge-generation region, configured to implement a photogate structure, through which a light is incident on the buried charge-generation region; a well region of the first conductivity type having a higher impurity concentration than the supporting-layer and buried in the upper portion of the supporting-layer; and a charge-readout region of the second conductivity type having a higher impurity concentration than the buried charge-generation region and buried in the upper portion of the supporting-layer at an edge of the well region toward the buried charge-generation region, wherein the impurity concentration of the shield region is set to a value such that an electrostatic potential at a surface side of the shield region is changeable by a voltage applied to the transparent electrode, and a surface potential of the shield region is pinned by charges of the first conductivity type by the electrostatic potential induced in the shield region.
 7. The solid-state imaging device of claim 6, wherein each of the plurality of pixels further comprises: a reset-drain region of the second conductivity type having a higher impurity concentration than the buried charge-generation region and buried in an upper portion of the well region separately from the charge-readout region; and a reset-gate electrode stacked on the gate insulating-film and allocated above the well region between the charge-readout region and the reset-drain region.
 8. The solid-state imaging device of claim 7, wherein in each of the plurality of pixels, when a voltage is applied to the reset-gate electrode, charges accumulated in the charge-readout region are exhausted to the reset-drain region so as to reset the charge-readout region.
 9. The solid-state imaging device of claim 6, wherein in each of the plurality of pixels, the charge-readout region is in contact with the buried charge-generation region and the shield region.
 10. The solid-state imaging device of claim 6, wherein in each of the plurality of pixels, the charge-readout region is separated from the buried charge-generation region and the shield region, a transfer-gate electrode is further stacked on the gate insulating-film and allocated above the supporting-layer between the buried charge-generation region and the shield region and the charge-readout region, and when a voltage is applied to the transfer-gate electrode, signal charges are transferred from the buried charge-generation region to the charge-readout region.
 11. The solid-state imaging device of claim 6, further comprising a photogate scanner provided at a periphery of a pixel region in which the plurality of pixels are arranged, and configured to apply, to the transparent electrode in each of the plurality of pixels, a first voltage at which a surface potential at an interface between the shield region and the gate insulating-film is pinned by the charges of the first conductivity type and a second voltage shifted from the first voltage in a direction in which a channel potential of the buried charge-generation region deepens, each of the first voltage and the second voltage being applied at a timing of each of divided periods of one frame.
 12. The solid-state imaging device of claim 11, further comprising a reset-transistor scanner provided at the periphery of the pixel region, and configured to apply, to the reset-gate electrode in each of the plurality of pixels, a reset voltage for exhausting charges from the charge-readout region to the reset-drain region so as to reset the charge-readout region in a period in which the second voltage is applied, the charges having polarity shifted in an identical direction in which the second voltage is shifted. 